离子镀膜法制备铀薄膜的表征

    Characterization of Uranium Thin Film Prepared by Ion Plating

    • 摘要: 研究了离子镀膜法制备铀薄膜的性质,可为改善薄膜性能、完善过程模型、优化制备参数和提高制备效率提供依据。本工作通过扫描电子显微镜和X射线衍射分别测量了离子镀膜法制备铀薄膜的表面形貌和物相结构,通过俄歇电子能谱和X射线光电子能谱结合Ar+溅射深度剖析,对离子镀膜法制备铀薄膜的元素成分、化学形态及纵深方向的分布进行了分析。分析结果表明:制备的铀薄膜在基体上分布连续,主要物相为CaF2类型面心结构UO2,主要形态为UO2、金属U和FeUO4化合物。

       

      Abstract: Uranium thin film prepared by ion plating was characterized on aspects of valances, components, morphology and compact texture, with X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), scanning electron microscopy (SEM) and X-ray diffraction (XRD). The results indicate that uranium thin film on the stainless steel matrix is continuous and consists of UO2, metal U and FeUO4. The analysis also reveals that the crystal structure of thin film is a face-centered cubic.

       

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