Abstract: Based on the molecular plating and brush plating technology, a new method for preparing large-area ²⁴¹Am source was developed. Compared with the traditional molecular plating, it broke through the restrictions of plating tank so that the active area of the source could be increased; and also, the automatic 2D travelling equipment resolved the problem of uniformity of large-area source through the controllable and well-regulated movement to and fro. Some sources were prepared to explore some experimental conditions such as time, voltage, and the acidity of solution that influenced the deposition efficiency of  ²⁴¹Am. The uniformity and firmness of sources were also discussed.