ThF4浓度对CeF3-ThF4-LiCl-KCl熔盐中Th电解沉积的影响

    Effect of ThF4 Concentration on Th Electrodeposition in CeF3-ThF4-LiCl-KCl Molten Salt

    • 摘要: 研究了高ThF4浓度下的CeF3-ThF4-LiCl-KCl熔盐中Th的电化学沉积行为。ThF4的质量分数从3%增加为10%时,Th(Ⅳ)的初始还原电位略微正移(从-1.75 V正移至-1.72 V,vs. Ag/AgCl)。熔盐中Th(Ⅳ)浓度的增大会导致其初始还原电位正移,而F-浓度的增大则导致其负移。电解沉积时,10%(质量分数,下同)ThF4体系的初始电解速率和阴极沉积量明显高于3%ThF4体系,表明Th(Ⅳ)浓度是影响Th电解速率的重要因素;而在Th(Ⅳ)浓度相同的情况下,F-浓度越大,电解速率越低。电解结果表明,0.3%CeF3-10%ThF4-LiCl-KCl四元熔盐中Th的分离率可达99.7%,而Ce几乎无析出。

       

      Abstract: In this paper, the electrochemical deposition of Th in CeF3-ThF4-LiCl-KCl molten salt with high ThF4 concentration was studied. When the concentration of ThF4 increases from 3%(w) to 10%, the initial reduction potential of Th(Ⅳ) has a slight positive shift from -1.75 V to -1.72 V (vs. Ag/AgCl). The increase of Th(Ⅳ) concentration can lead to a positive shift of the initial reduction potential, while the increase of F- concentration will lead to a negative shift. The initial electrolytic rate and cathodic deposition amount of 10% ThF4 system are significantly higher than those of 3% ThF4 system, indicating that the concentration of Th(Ⅳ) is an important factor of the electrolytic extraction of thorium; meanwhile, under the same Th(Ⅳ) concentration, the higher the F- concentration is, the lower the electrolytic rate will be. The electrolysis results show that the separation rate of Th in 0.3%CeF3-10%ThF4-LiCl-KCl molten salt can reach 99.7%, and Ce has almost no electrolytic extraction.

       

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