B-带受激六氟化铀紫外光解离
UV PHOTODISSOCIATION OF UF_6 EXCITED IN THE B- BAND
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摘要: 本文在低压汞灯253.7nm紫外光辐照下研究了在B-x带受激的UF_6的光解离。在H_2存在时UF_6产生明显的光解离,发现入射光强对光解离速率成正比关系,而外加气体的性质和压力对UF_6的解离没有影响。对UF_6-H_2体系,测得UF_6光解离的表观量子产额为1.8±0.1。以CO为F原子清除剂时,在相似条件下测得UF_6的光解离速率比H_2存在时低,表观量子产额为1.1±0.1。还讨论了在H_2或CO存在下处于B-x带受激的UF_6紫外光解离的机理。Abstract: The UV photodissociation of UF6 excited in the B-X band is investigated with the 253.7 nm radiation from a filter Hg lamp. In the presence of H2, the dissociation yields are measured as a function of the incident light intensity, the partial pressure of hydrogen and various gas additives (Ar, N2 and SF6). The apparent quantum yield of 1.8±0.1 is observed for UF6-H2 system and of near unity for UF6-CO system. The UV photodissociation machanism of UF6 excited in the B-X band is discussed.