熔融底物的Wilzbach曝射法

    THE USE OF MELT SUBSTRATE IN THE WILZBACH EXPOSURE METHOD

    • 摘要: 对熔融底物的曝射法与原来的Wilzbach曝射法进行了比较。结果表明这种改进的Wilzbach曝射法的氚标记效率是原来方法的5.2倍。如果在熔融曝射期间高频放电10min,其氚标记效率是原来方法的46倍。 在底物的熔点进行标记,比在室温(25℃)更有效。 当氚气压力低于40mmHg时,氚标记效率与氚气压力成正比;高于40mmHg时,氚标记效率几乎保持不变。

       

      Abstract: A modified Wilzbach method——the melt substrate exposure method is developed, whichgives a tritium labelling efficiency 5.2 times higher than that of the original Wilzbach exposure, and, if during the melt exposure a high frequency electric discharge is passed through the tritium gas for 10 minutes, the tritium labelling efficiency becomes 46 times higher than the original method.It seems that the labelling is more efficient at the melting point of the substrate than at room temperature (25℃).The tritium labelling efficiency obtained is directly proportional to the pressure of the tritium gas when the pressure is less than 40 mmHg, but it is nearly constant when the pressure is raised above 40 mmHg.

       

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