CHEMICAL VAPOR DEPOSITION WITH INTENSE PULSED ELECTRON BEAM ON THE SURFACE OF POLYETHYLENE TEREPHTHALATE FILM[J]. Journal of Nuclear and Radiochemistry, 1988, 10(4): 245-245.
    Citation: CHEMICAL VAPOR DEPOSITION WITH INTENSE PULSED ELECTRON BEAM ON THE SURFACE OF POLYETHYLENE TEREPHTHALATE FILM[J]. Journal of Nuclear and Radiochemistry, 1988, 10(4): 245-245.

    CHEMICAL VAPOR DEPOSITION WITH INTENSE PULSED ELECTRON BEAM ON THE SURFACE OF POLYETHYLENE TEREPHTHALATE FILM

    • Copper nitride films are deposited on the surface of polyethylene terephtha-late film by using intense pulsed electron beam to create a high temperature dense plasma.The irradiation effect of the electron beam on polymers has been observed and chemical properties of these films are described.A variety of chemical species could be created by using this method of chemical vapor deposition with an intense pulsed electron beam.
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